Chemical Vapor Deposition (CVD)


Chemical Vapor Deposition is chemical reactions which transform gaseous molecules , called precursor, into a solid material , in the form of thin film or powder, on the surface of a substrate .

The process is widely used to fabricate semiconductor devices.



Home of Hsin-Tien Chiu
E-mail: htchiu@chiuserv.ac.nctu.edu.tw
Last Updated August 12, 1998